1. Glass window substrate
Bombarding the surface layer of the material with plasma technology can effectively eliminate the surface pollution source and greatly improve the water absorption of the surface layer of the product workpiece. The angle of the water droplets after cleaning is less than 5 degrees, which lays a good foundation for the development of the next process.
2. Modification of the surface layer of anodized ITO
Using plasma technology to modify the surface layer of anodized ITO can effectively optimize its surface chemical composition, greatly reduce the square resistance, and thus effectively improve the energy conversion rate and improve the photovoltaic performance of electronic components.
3. Pretreatment of protective film
The surface layer of the single crystal silicon wafer is very bright and will refract a large amount of light. Therefore, it is very necessary to deposit a layer of silicon nitride protective film with a very small reflectivity on it. By using plasma technology, the surface layer of the single crystal silicon wafer can be activated and its surface adhesion can be greatly improved.
Battery industry
● Improve the welding of pole ears, pole pieces and electrode columns to improve quality and reduce internal resistance;
● Pre-treatment of shell coating to improve adhesion;
● Post-processing process of separation of positive and negative electrode materials of batteries to eliminate fine particles on the surface layer and improve the quality of battery cells;
COMPANY:Shenzhen Jietongtai Technology Co., Ltd
Contact:Mr. Zhou
Tel:13410974163
Phone:15338087819
Email:mail@jietongtai.com
Add:A3 Floor, Hongda Phase III Factory, No. 9-2 Xingye 3rd Road, Fenghuang Community, Fuyong Street, Bao'an District, Shenzhen